Wafer-Scale Assembly of Highly Ordered Semiconductor Nanowire Arrays by Contact Printing

Author

Zhiyong Fan ,Johnny C. Ho , Zachery A. Jacobson , Roie Yerushalmi , Robert L. Alley , Haleh Razavi , and Ali Javey

Journal

Nanoletters

Publication Date

08/16/2007

Abstract

Controlled and uniform assembly of “bottom-up” nanowire (NW) materials with high scalability presents one of the significant bottleneck challenges facing the integration of nanowires for electronic applications. Here, we demonstrate wafer-scale assembly of highly ordered, dense, and regular arrays of NWs with high uniformity and reproducibility through a simple contact printing process. The assembled NW pitch is shown to be readily modulated through the surface chemical treatment of the receiver substrate, with the highest density approaching 8 NW/μm, 95% directional alignment, and wafer-scale uniformity. Such fine control in the assembly is attained by applying a lubricant during the contact printing process which significantly minimizes the NW−NW mechanical interactions, therefore enabling well-controlled transfer of nanowires through surface chemical binding interactions. Furthermore, we demonstrate that our printing approach enables large-scale integration of NW arrays for various device structures on both rigid silicon and flexible plastic substrates, with a controlled semiconductor channel width ranging from a single NW (10 nm) up to 250 μm, consisting of a parallel array of over 1250 NWs and delivering over 1 mA of ON current.

You have no rights to post comments


Date added: 2012-08-25 15:47:15 | Last time updated: 2012-08-25 13:47:15 | Viewed: 837 times

Latest Topics

  • No posts to display.

Copyright MicroContactPrinting 2012 - Réalisé par MidiConcept - Site map - Legals