Spatial control over atomic layer deposition using microcontact-printed resists

Abstract

Area-selective thin film growth by atomic layer deposition (ALD) has been achieved on octadecyltrichlorosilane (ODTS) patterned substrates. Patterned hydrophobic self-assembled monolayers (SAMs) were first transferred to silicon and yttria-stabilized zirconia (YSZ) substrates by microcontact printing. Subsequently, films of either HfO2 or Pt were grown selectively on the SAM-free regions of the surface, while ALD was blocked in regions where ODTS was present. The deposited pattern was readily observed through scanning electron microscopy and scanning Auger imaging, demonstrating that soft lithography is a simple and promising method to achieve area-selective ALD. The selectivity of the soft lithography-based method and the subsequent pattern resolution was compared for Pt versus HfO2. It was found that using ODTS films, it is easier to achieve complete deactivation of Pt than HfO2.

Link

Spatial control over atomic layer deposition using microcontact-printed resists